半导体设备

XD-MA150 掩模对准光刻机

日期:2025-06-16
我要分享

MODEL:XD-MA150
XD-MA150  掩模对准光刻机
XD-MA150  Mask Aligner
 
 
产品特色 FEATURE OF PRODUCT
 
▶ 采用三轴式全自动误差补偿系统.
Adopting a three-axis fully automatic error compensation system.
 
▶双料盒模式+同时传载3片晶圆片.
  Dual material box mode+simultaneous transfer of 3 wafers.
 
▶预对准采用非接触式,避免Wafer损坏和污染。
Prealignment is non-contact to avoid wafer damage and contamination.
 
▶多尺寸的规格夹具.
Multi sized specification fixtures.
 
 
 
外形尺寸 Dimensions